The manufacturers of Hydrocarbon Resins, Rosin Resins and Pine Chemicals Materials joined forces for their REACH compliance activities. They launched the H4R REACH Consortium in October 2008 and successfully registered 28 substances before the 2010 REACH deadline.
The H4R Consortium structure includes a Steering Committee, a Technical Committee, a Chairmen's Committee and specific substance working groups. All of which are managed by Penman Consulting.
The H4R Consortium is open to manufacturers/importers and Only Representatives as defined in the REACH Regulation of the substance on its own, in preparations or in articles and that are subject to the registration requirements, pursuant to the REACH Regulation, or Affiliates thereof.
Membership is open to any applicant fulfilling the membership criteria. The H4R Consortium is also open to any European and non-European companies manufacturing or importing of Hydrocarbon Resins, Rosin Resins and Pine Chemicals Materials which are similar to one or several of the substances covered. Downstream users and other data holders are invited to play an active role in the work of the consortium.
If you would like to join the H4R Consortium, please contact email@example.com
- Sun Chemical Colors & Effects
- LES DERIVES RESINIQUES ET TERPENIQUES (DRT)
- Pino Pine Produtos Quimicos S.A.
- Forchem Oy
- Kraton Chemical B.V.
- Lawter Europe BV
- Mare S.p.A.
- Megara Resins SA
- Respol Resinas SA
- Rain Carbon Germany GmbH
- Siegwerk Druckfarben AG & Co. KGaA
- Synthos Dwory Sp. Z.o.o.
- LURESA RESINAS SL
This website is made available for public viewing on the basis that the H4R Consortium or Penman Consulting exclude to the extent lawfully permitted all liability whatsoever for any loss or damage arising out of use of this website. Further, whilst we endeavour to ensure the accuracy and completeness of the content of the pages of this website, the H4R Consortium and Penman Consulting do not accept any liability or responsibility for loss occasioned as a result of reliance placed on any part of its contents.
© 2017 to present, H4R Consortium